READ THE SURFACE ISSUE OF
THE LITHOGRAPHER

We're excited to announce the third edition of The Lithographer, a MLL MLA NanoFab magazine providing exciting insights into the world of direct-write lithography. From our latest innovations to pioneering applications, this issue is your guide to the innovations shaping the future of research and industry.

Take a look inside

MLL MLA NANOFAB –
THE POWER OF DIRECT WRITING

For years, MLL MLA NanoFab has been a leader in innovation and excellence in maskless lithography systems. This dedication to excellence has translated into a track record of solving complex challenges for our global customers. Our technology is used to advance fields ranging from micro-optics and MEMS to microfluidics and microelectronics, as well as next-generation semiconductor research and specialized application fields in nanotechnology, microfluidics, life sciences, and photonics. The result is a portfolio of solutions that consistently deliver faster, more precise, and reliable performance for our customers.

We offer a broad and deep portfolio of direct-write lithography systems, from laser lithography systems with large writing fields, high resolution, and advanced alignment capabilities to nanopatterning systems using electron beam lithography, 2-photon lithography, or nanoimprint lithography. Our equipment is used for research and production in fields such as photonics, quantum technologies, and microoptics, enabling researchers and industry innovators to push the boundaries of what is possible.

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KEY FEATURES

APPLICATIONS

Explore the diverse applications of our maskless lithography systems in fields such as micro-optics, MEMS, microfluidics, and next-generation semiconductor research.

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CORE TECHNOLOGIES

Our portfolio includes laser lithography, electron beam lithography, two-photon lithography, and nanoimprint lithography for advanced nanopatterning.

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KEY FEATURES

Discover the high precision, excellent alignment capabilities, and intuitive operation of our systems designed for both research laboratories and industrial environments.

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PRODUCTS

µMLA Maskless Aligner

Configurable maskless aligner for rapid prototyping and small-scale production, combining speed and flexibility.

MLA 150 Maskless Aligner

The industry-standard tool for fast and precise direct writing in R&D and pilot production, offering unparalleled performance.

DML 66" Laser Lithography System

Our versatile system for large-area maskless direct writing, ideal for production applications such as photomasks and sensors.

NEWS BLOG

THE GLASS REVOLUTION:
WHY MASKLESS LITHOGRAPHY IS THE KEY TO NEXT-GEN AI PACKAGING

Discover how maskless lithography is revolutionizing the semiconductor industry, enabling advanced packaging for AI and machine learning applications.

MLL MLA NANOFAB RECEIVES REPEAT ORDER FROM LEADING ASIAN DISPLAY PRODUCER MANUFACTURER FOR ITS VPG 1400 PPS SYSTEM

MLL MLA NanoFab announces a significant repeat order for its VPG 1400 PPS system from a top-tier manufacturer, reinforcing its position in the display industry.

BETA SITE INSTALLATION OF NANOIMPRINTER WITH PARALLEL EXPOSURE CAPABILITIES AT EPFL

We are excited to announce the installation of our latest Nanoimprinter technology at EPFL, marking a key milestone for nanofabrication research in Switzerland.

TECHNOLOGY SHOWCASE

Laser Lithography

Direct-write with sub-micron resolution and large writing fields for rapid prototyping and production.

Two-Photon Lithography

3D nanopatterning with sub-100 nm resolution for complex microstructures and photonic crystals.

Nanoimprint Lithography

High-throughput replication of nanoscale patterns with exceptional fidelity for large-area fabrication.

Electron Beam Lithography

Ultra-high-resolution patterning for advanced semiconductor research and nanodevice fabrication.

APPLICATIONS OVERVIEW

Micro-optics

Precision optical elements with sub-micron features for imaging and sensing.

MEMS

Micro-electromechanical systems with high aspect ratio structures.

Microfluidics

Lab-on-a-chip devices and diagnostic platforms for biomedical analysis.

Photonics

Integrated photonic circuits and metasurface devices for data communication.

Semiconductor R&D

Next-generation device prototyping and advanced packaging research.

Life Sciences

Biochips, organ-on-a-chip platforms, and diagnostic sensors for healthcare.

CUSTOMER STORIES

"The MLA 150 has transformed our prototyping workflow. We can iterate designs in hours instead of weeks."

Dr. John D., Stanford University

"NanoFab's support team is exceptional. They helped us integrate the DML 66 into our production line seamlessly."

Maria L., Photonics Inc.

"The two-photon lithography system opened up new possibilities for our 3D microstructures research."

Prof. Alex R., MIT

TRUSTED PARTNERS

Leading organizations that rely on MLL MLA NanoFab systems

Applications

Discover the diverse fields where MLL MLA NanoFab systems drive innovation.

Micro-optics

Precision optical elements including microlenses, diffractive optics, and waveguides with sub-micron features.

MEMS

Micro-electromechanical systems: accelerometers, gyroscopes, and actuators with high aspect ratio structures.

Microfluidics

Lab-on-a-chip devices, diagnostic platforms, and fluidic networks for biomedical and chemical analysis.

Semiconductor R&D

Next-generation device prototyping, advanced packaging, and process development for semiconductor research.

Photonics

Integrated photonic circuits, optical interconnects, and metasurface devices for data communication and sensing.

Life Sciences

Biochips, organ-on-a-chip platforms, and diagnostic sensors for healthcare and biotechnology research.